COST ACTION 528 Working Groups

COST Action 528
Chemical Solution Deposition of Thin Films

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NEWS

The workshop of COST Action 528 will be held in Prague 13 to 15 November 2005. This will coincide with the final meetings of Working Groups 1 and 2 and the Management Committee Meeting.
Information can be found on the website at the link http://palata.fzu.cz/cost528/

OBJECTIVES

The main objective of the COST-action 528 is to improve the physical and electronic properties of thin films (thickness < 20 痠) made by chemical solution deposition techniques focusing on the sol-gel, liquid source CVD and spray pyrolysis methods to the quality required for the micro-electronics, opto-electronics, and micro-systems industries. To that end, knowledge of the precursor chemistry and processing, microstructure and nanostructure, and physics of the resulting thin films will need to be increased, and tailored to the requirements of these industries, especially for integration in larger process flows.
More on the work in COST Action 528 can be found on this site in the detailed description and in the current projects.

Page maintained by Bernard Watts, email: watts@imem.cnr.it

COST Action 528 Chemical Solution Deposition of Thin Films

NEWS

OBJECTIVES

COST Action 528
Chemical Solution Deposition of Thin Films