Growth of Nanostructured and Functional Materials
Contact person: Verucchi Roberto
CVD
   FOR MORE INFORMATION: Matteo Bosi - +39 0521269288 - matteo.bosi@imem.cnr.it

 

In chemical vapor deposition (CVD), the precursors (powders and/or gases) are transported in vapor phase in an open tube by an inert carrier gas. The precursors react in a hot zone and the nanostructures of interest are synthesized. It is a low cost but extremely versatile technique that allows good control of the synthesis of different types of nanostructures.

The technique is used for the deposition of different types of nanostructures such as:

 

CVD
General scheme of a CVD system.